Advanced processes for Si:P and Si:C:P epitaxial growth and low-temperature surface cleaning

Profijt, HaraldHaraldProfijtRosseel, ErikErikRosseelTolle, JohnJohnTolleWeeks, K.D.K.D.WeeksLoo, RogerRogerLooMehta, SandeepSandeepMehtaMaes, JanJanMaes2021-10-222021-10-222014-11https://imec-publications.be/handle/20.500.12860/24400Advanced processes for Si:P and Si:C:P epitaxial growth and low-temperature surface cleaningMeeting abstract