Ercken, MoniqueMoniqueErckenLeunissen, PeterPeterLeunissenPollentier, IvanIvanPollentierPatsis, G.G.PatsisConstantoudis, V.V.ConstantoudisGogolides, EvangelosEvangelosGogolides2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8888Effects of different processing conditions on line edge roughness for 193-nm and 157-nm resistsProceedings paper