Comparative study of the growth behaviour of 2D WS2 by Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD), and the impact on the 2D crystal structure

Groven, BenjaminBenjaminGrovenClaes, DieterDieterClaesHeyne, MarkusMarkusHeyneMeersschaut, JohanJohanMeersschautNuytten, ThomasThomasNuyttenRichard, OlivierOlivierRichardBender, HugoHugoBenderConard, ThierryThierryConardVerdonck, PatrickPatrickVerdonckVan Elshocht, SvenSvenVan ElshochtRadu, IulianaIulianaRaduThean, AaronAaronTheanHeyns, MarcMarcHeynsCaymax, MattyMattyCaymaxDelabie, AnneliesAnneliesDelabie2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26668Comparative study of the growth behaviour of 2D WS2 by Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD), and the impact on the 2D crystal structureProceedings paper