Atomic layer deposited Gd-doped HfO2 thin films: from high-k dielectrics to ferroelectrics

Adelmann, ChristophChristophAdelmannRagnarsson, Lars-AkeLars-AkeRagnarssonMoussa, AlainAlainMoussaWoicik, JosephJosephWoicikMueller, StefanStefanMuellerSchoeder, UweUweSchoederAfanasiev, ValeriValeriAfanasievVan Elshocht, SvenSvenVan Elshocht2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20256Atomic layer deposited Gd-doped HfO2 thin films: from high-k dielectrics to ferroelectricsMeeting abstract