Impact of Al-doping on Al:HfO2 dielectric reliability in MIM capacitors

Fohn, CorinnaCorinnaFohnZharfan, F.F.ZharfanChery, EmmanuelEmmanuelCheryCroes, KristofKristofCroesStucchi, MicheleMicheleStucchiAfanasiev, ValeriValeriAfanasiev2025-11-272025-11-272025-01-01979-8-3315-0478-61541-7026https://imec-publications.be/handle/20.500.12860/58472engImpact of Al-doping on Al:HfO2 dielectric reliability in MIM capacitorsProceedings paper10.1109/IRPS48204.2025.10982827WOS:001546466200025HFO2(100)SIHFALO