Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxide

Krishtab, MikhailMikhailKrishtabHung, JoeyJoeyHungKoret, RoyRoyKoretTurovets, IgorIgorTurovetsShah, KavitaKavitaShahRangarajan, SrinivasanSrinivasanRangarajanWarad, LaxmiLaxmiWaradZhang, VanessaVanessaZhangAmeloot, RobRobAmelootArmini, SilviaSilviaArmini2021-10-282021-10-282020https://imec-publications.be/handle/20.500.12860/35415Plasma halogenated amorphous carbon as growth inhibiting layer for area-selective deposition of titanium oxideProceedings paperhttps://doi.org/10.1117/12.2551492