The critical role of the metal / porous low-k interface in post direct CMP defectivity generation and resulting ULK surface and bulk hydrophilisation

Travaly, YoussefYoussefTravalySinapi, FabriceFabriceSinapiHeylen, NancyNancyHeylenHumbert, AurelieAurelieHumbertDelande, TinneTinneDelandeCaluwaerts, RudyRudyCaluwaertsGueneau de Mussy, Jean PaulJean PaulGueneau de MussyVereecke, GuyGuyVereeckeBaklanov, MikhaïlMikhaïlBaklanovIacopi, FrancescaFrancescaIacopiHernandez, Jose LuisJose LuisHernandezBeyer, GeraldGeraldBeyerFischer, PamelaPamelaFischer2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12989The critical role of the metal / porous low-k interface in post direct CMP defectivity generation and resulting ULK surface and bulk hydrophilisationProceedings paper