Low-temperature atomic and molecular hydrogen anneals for enhanced chemical SiO2 IL quality in low thermal budget RMG stacks

Franco, JacopoJacopoFrancoArimura, HiroakiHiroakiArimurade Marneffe, Jean-FrancoisJean-Francoisde MarneffeWu, ZhichengZhichengWuVandooren, AnneAnneVandoorenRagnarsson, Lars-AkeLars-AkeRagnarssonDentoni Litta, EugenioEugenioDentoni LittaHoriguchi, NaotoNaotoHoriguchiCroes, KristofKristofCroesLinten, DimitriDimitriLintenAfanasiev, ValeriValeriAfanasievGrasser, T.T.GrasserKaczer, BenBenKaczer2022-08-252022-07-092022-08-2520212380-9248WOS:000812325400158https://imec-publications.be/handle/20.500.12860/40082Low-temperature atomic and molecular hydrogen anneals for enhanced chemical SiO2 IL quality in low thermal budget RMG stacksProceedings paper10.1109/IEDM19574.2021.9720657978-1-6654-2572-8WOS:000812325400158