Hooge, JoshuaJoshuaHoogeHatakeyama, ShinichiShinichiHatakeyamaKubo, AkihiroAkihiroKuboKondo, YoshihiroYoshihiroKondoNafus, KathleenKathleenNafusScheer, StevenStevenScheerFoubert, PhilippePhilippeFoubertLeray, PhilippePhilippeLerayCheng, ShauneeShauneeCheng2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13887Understanding and improving double patterning CDU through Monte Carlo simulationProceedings paper