Processing factors influencing the leakage current in shallow junction diodes for deep submicro-meter CMOS

Grau, LluisLluisGrauAugendre, EmmanuelEmmanuelAugendreSimoen, EddyEddySimoenRooyackers, RitaRitaRooyackersClaeys, C.C.ClaeysBadenes, GonçalGonçalBadenesRomano-Rodriguez, A.A.Romano-Rodriguez2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5319Processing factors influencing the leakage current in shallow junction diodes for deep submicro-meter CMOSJournal article