Dependence of the minimal PVD Ta(N) sealing thickness on the porosity of Zirkon low-k films

Iacopi, FrancescaFrancescaIacopiZistl, C.C.ZistlJehoul, ChristianeChristianeJehoulTokei, ZsoltZsoltTokeiLe, Quoc ToanQuoc ToanLeDas, ArabindaArabindaDasSullivan, C.C.SullivanProkopowicz, G.G.ProkopowiczGronbeck, D.D.GronbeckGallagher, M.M.GallagherCalvert, J.J.CalvertMaex, KarenKarenMaex2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6421Dependence of the minimal PVD Ta(N) sealing thickness on the porosity of Zirkon low-k filmsJournal article