The impact of sub monolayers of HfO2 on the device performance of high-k transistors

Ragnarsson, Lars-AkeLars-AkeRagnarssonPantisano, LuigiLuigiPantisanoKaushik, VidyaVidyaKaushikSaito, S.I.S.I.SaitoShimamoto, YasuhiroYasuhiroShimamotoDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-152021-10-152003-12https://imec-publications.be/handle/20.500.12860/8057The impact of sub monolayers of HfO2 on the device performance of high-k transistorsProceedings paper