Kim, Kee - HoKee - HoKimRonse, KurtKurtRonseGoethals, MiekeMiekeGoethalsVandenberghe, GeertGeertVandenbergheVan den hove, LucLucVan den hove2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1292CD control for 180-nm and 130-nm gate-level lithographyJournal article