Exploration of EUV-based self-aligned multipatterning (SAMP) options targeting pitches below 20 nm

Decoster, StefanStefanDecosterLazzarino, FredericFredericLazzarinoVangoidsenhoven, DizianaDizianaVangoidsenhovenBlanco, VictorVictorBlancoTamaddon, Amir-HosseinAmir-HosseinTamaddonKesters, ElsElsKestersLorant, ChristopheChristopheLorant2021-10-272021-10-272019https://imec-publications.be/handle/20.500.12860/32852Exploration of EUV-based self-aligned multipatterning (SAMP) options targeting pitches below 20 nmProceedings paperhttps://doi.org/10.1117/12.2515173