Process development of ALD-rutile-TiO2/Ru(Ox) for DRAM MIMcap application and its leakage mechanism analysis

Tomida, KazuyukiKazuyukiTomidaPopovici, Mihaela IoanaMihaela IoanaPopoviciSwerts, JohanJohanSwertsWang, MugwortMugwortWangKaczer, BenBenKaczerPawlak, MalgorzataMalgorzataPawlakVan Elshocht, SvenSvenVan ElshochtKim, Min-SooMin-SooKimDebusschere, IngridIngridDebusschereAfanasiev, ValeriValeriAfanasievAltimime, LaithLaithAltimimeKittl, JorgeJorgeKittl2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19901Process development of ALD-rutile-TiO2/Ru(Ox) for DRAM MIMcap application and its leakage mechanism analysisProceedings paper