Pattern collapse and particle removal forces of interest to semiconductor fabrication process

Kim, Tae-GonTae-GonKimWostyn, KurtKurtWostynPark, Jin-GooJin-GooParkMertens, PaulPaulMertensBusnaina, AhmedAhmedBusnaina2021-10-172021-10-1720091662-9779https://imec-publications.be/handle/20.500.12860/15599Pattern collapse and particle removal forces of interest to semiconductor fabrication processJournal articlewww.scientific.net