Fonseca, CarlosCarlosFonsecaHead, Brian H.Brian H.HeadShite, HideoHideoShiteNafus, KathleenKathleenNafusGronheid, RoelRoelGronheidWinroth, GustafGustafWinroth2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/18919Understanding EUV resist dissolution characteristics and its impact to RLS limitationsProceedings paper