Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithography

Rathore, AshishAshishRathoreCipriani, MaicolMaicolCiprianiHuang, Ching-ChungChing-ChungHuangAmiaud, LionelLionelAmiaudDablemont, CelineCelineDablemontLafosse, AnneAnneLafosseIngolfsson, OddurOddurIngolfssonDe Simone, DaniloDaniloDe SimoneDe Gendt, StefanStefanDe Gendt2023-01-192021-11-022023-01-1920211463-9076WOS:000639536400001https://imec-publications.be/handle/20.500.12860/38012Electron-induced fragmentation mechanisms in organic monomers and their implications for photoresist optimization for EUV lithographyJournal article10.1039/d1cp00065aWOS:000639536400001MEDLINE:33885061