Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surface

Boullart, WernerWernerBoullartMannaert, GeertGeertMannaertGraham, S.S.GrahamTarassenko, C.C.TarassenkoMouche, LaurentLaurentMouche2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2416Post metal etch polymer removal: an investigation of the cleaning to remove residual of Si-C and Si-F after fluorocarbon plama etch on the silicon surfaceOral presentation