Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device mode

Montgomery, Patrick K.Patrick K.MontgomeryLucas, Kevin D.Kevin D.LucasLitt, Lloyd C.Lloyd C.LittConley, WillWillConleyFanucchi, EricEricFanucchivan Wingerden, JohannesJohannesvan WingerdenVandenberghe, GeertGeertVandenbergheWiaux, VincentVincentWiauxTaylor, DarrenDarrenTaylorCangemi, Michael J.Michael J.CangemiKasprowicz, BryanBryanKasprowicz2021-10-152021-10-152003-12https://imec-publications.be/handle/20.500.12860/7912Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65nm device modeProceedings paper