Kaushik, VidyaVidyaKaushikClaes, MartineMartineClaesDelabie, AnneliesAnneliesDelabieVan Elshocht, SvenSvenVan ElshochtRichard, OlivierOlivierRichardConard, ThierryThierryConardRohr, ErikaErikaRohrWitters, ThomasThomasWittersCaymax, MattyMattyCaymaxDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeyns2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9115Observation and characterization of defects in HfO2 High-K gate dielectric layersProceedings paper