Sebaai, FaridFaridSebaaidel Agua Borniquel, Jose IgnacioJose Ignaciodel Agua BorniquelVos, RitaRitaVosAbsil, PhilippePhilippeAbsilChiarella, ThomasThomasChiarellaVrancken, ChristaChristaVranckenBoelen, PieterPieterBoelenBaiya, EvansEvansBaiya2021-10-182021-10-1820091662-9779https://imec-publications.be/handle/20.500.12860/16186Poly- silicon etch with diluted ammonia: application to replacement gate integration schemeJournal articlehttp://www.scientific.net