Gupta, MihirMihirGuptaAfonso, Joao AntunesJoao AntunesAfonsoBezard, PhilippePhilippeBezardVallat, RemiRemiVallatFallica, RobertoRobertoFallicaSuh, Hyo SeonHyo SeonSuhHalder, SandipSandipHalderDe Simone, DaniloDaniloDe SimoneLiu, ZechengZechengLiuRan, FanyongFanyongRanFukuda, HideakiHideakiFukudaSun, YitingYitingSunDe Roest, DavidDavidDe RoestPiumi, DanieleDanielePiumi2024-03-072023-07-282024-03-072023978-1-5106-6103-50277-786XWOS:001022961000015https://imec-publications.be/handle/20.500.12860/42223Scaled-down deposited underlayers for EUV lithographyProceedings paper10.1117/12.2660376978-1-5106-6104-2WOS:001022961000015