Kobayashi, ShinjiShinjiKobayashiShimura, SatoruSatoruShimuraKawasaki, TetsuTetsuKawasakiNafus, KathleenKathleenNafusHatakeyama, ShinichiShinichiHatakeyamaShite, HideoHideoShiteNishimura, EiichiEiichiNishimuraKushibiki, MasatoMasatoKushibikiHara, ArisaArisaHaraGronheid, RoelRoelGronheidVaglio Pret, AlessandroAlessandroVaglio PretKitano, JunichiJunichiKitano2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17391LWR reduction by novel lithographic and etch techniquesProceedings paper