Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applications

Wong, AlfredAlfredWongNeureuther, A. R.A. R.Neureuther2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/1026Rigorous three-dimensional time-domain finite-difference electromagnetic simulation for photolithographic applicationsJournal article