Dundas, C.C.DundasVroom, R.R.VroomGhekiere, JohnJohnGhekiereVan Doorne, PatrickPatrickVan DoorneRink, I.I.RinkSharp, I.I.SharpHeffernan, S.S.Heffernan2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7542Alternative post-etch polymer removal in a single-wafer platformProceedings paper