Vaglio Pret, AlessandroAlessandroVaglio PretGronheid, RoelRoelGronheidGraves, TreyTreyGravesSmith, Mark D.Mark D.SmithBiafore, JohnJohnBiafore2021-10-192021-10-192011https://imec-publications.be/handle/20.500.12860/19933Impact of mask line roughness in EUV lithographyProceedings paper