New lithographic requirements for the implant levels in scaled devices

Vandeweyer, TomTomVandeweyerBaerts, ChristinaChristinaBaertsHoriguchi, NaotoNaotoHoriguchiErcken, MoniqueMoniqueErcken2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18229New lithographic requirements for the implant levels in scaled devicesOral presentation