Non-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yield

Vanhellemont, JanJanVanhellemontServidori, M.M.ServidoriHiggs, V.V.HiggsGramenova, EmiliaEmiliaGramenovaSimoen, EddyEddySimoenJansen, PhilippePhilippeJansen2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1616Non-destructive techniques for identification and control of processing induced extended defects in silicon and correlation with device yieldOral presentation