Electrical nanocharacterization of copper tetracyanoquinodimethane layers dedicated to resistive random access memories

Deleruyelle, DamienDamienDeleruyelleMuller, ChristopheChristopheMullerAmouroux, JulienJulienAmourouxMuller, RobertRobertMuller2021-10-182021-10-182010-060003-6951https://imec-publications.be/handle/20.500.12860/17006Electrical nanocharacterization of copper tetracyanoquinodimethane layers dedicated to resistive random access memoriesJournal articlehttp://dx.doi.org/10.1063/1.3458596