Nagahara, SeijiSeijiNagaharaDauendorffer, ArnaudArnaudDauendorfferThiam, ArameArameThiamLiu, XiangXiangLiuKuwahara, YuheiYuheiKuwaharaDinh, Cong QueCong QueDinhOkada, SoichiroSoichiroOkadaKawakami, ShinichiroShinichiroKawakamiGenjima, HisashiHisashiGenjimaNagamine, NoriakiNoriakiNagamineMuramatsu, MakotoMakotoMuramatsuShimura, SatoruSatoruShimuraTsuboi, AtsushiAtsushiTsuboiNafus, KathleenKathleenNafusFeurprier, YannickYannickFeurprierDemand, MarcMarcDemandRamaneti, RajeshRajeshRamanetiFoubert, PhilippePhilippeFoubertDe Simone, DaniloDaniloDe SimoneVandenberghe, GeertGeertVandenberghe2024-04-152023-07-282024-04-152023978-1-5106-6103-50277-786XWOS:001022961000036https://imec-publications.be/handle/20.500.12860/42227Recent advances in EUV patterning in preparation towards high-NA EUVProceedings paper10.1117/12.2657432978-1-5106-6104-2WOS:001022961000036