Enhancement of ALCVD(TM) TiN growth on Si-O-C and a-SiC:H films by O2-based plasma treatments

Satta, AlessandraAlessandraSattaBaklanov, MikhaïlMikhaïlBaklanovRichard, OlivierOlivierRichardVantomme, AndreAndreVantommeBender, HugoHugoBenderConard, ThierryThierryConardMaex, KarenKarenMaexLi, W.M.W.M.LiElers, K. E.K. E.ElersHaukka, S.S.Haukka2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6789Enhancement of ALCVD(TM) TiN growth on Si-O-C and a-SiC:H films by O2-based plasma treatmentsJournal article