Detavernier, C.C.DetavernierAlves Donaton, RicardoRicardoAlves DonatonMaex, KarenKarenMaexJin, S.S.JinBender, HugoHugoBenderVan Meirhaeghe, R.R.Van MeirhaegheCardon, F.F.Cardon2021-10-062021-10-061999https://imec-publications.be/handle/20.500.12860/3414The influence of Ti capping layers on CoSi2 formation in the presence of interfacial oxideProceedings paper