Goethals, MiekeMiekeGoethalsHendrickx, EricEricHendrickxJonckheere, RikRikJonckheereLorusso, GianGianLorussoBaudemprez, BartBartBaudemprezHermans, JanJanHermansLaidler, DavidDavidLaidlerNiroomand, ArdavanArdavanNiroomandVan Roey, FriedaFriedaVan Roeyvan Dijk, AndreAndrevan DijkRomijn, LeonLeonRomijnStepanenko, NickolayNickolayStepanenkoTimoshkov, VadimVadimTimoshkovIwamoto, FumioFumioIwamotoMyers, AlanAlanMyersHyun, YoonsukYoonsukHyunLim, ChangmoonChangmoonLimPollentier, IvanIvanPollentierLeeson, MichaelMichaelLeesonde Marneffe, Jean-FrancoisJean-Francoisde MarneffeDemuynck, StevenStevenDemuynckRonse, KurtKurtRonse2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13777Implementing full field EUV lithography using the ADTProceedings paper