Maes, JanJanMaesFedorenko, YaninaYaninaFedorenkoDelabie, AnneliesAnneliesDelabieRagnarsson, Lars-AkeLars-AkeRagnarssonSwerts, JohanJohanSwertsNyns, LauraLauraNynsVan Elshocht, SvenSvenVan ElshochtWang, C.C.WangWilk, G.G.Wilk2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/12537Impact of Hf-precursor choice on scaling and performance of high-k gate dielectricsProceedings paper