Lithography simulation with aerial image-variable threshold resist model

Randall, JohnJohnRandallGangala, Hareen KHareen KGangalaTritchkov, AlexanderAlexanderTritchkov2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/2893Lithography simulation with aerial image-variable threshold resist modelOral presentation