Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal design

Xu, DongboDongboXuGillijns, WernerWernerGillijnsTan, Ling EeLing EeTanPhilipsen, VickyVickyPhilipsenKim, Ryan Ryoung hanRyan Ryoung hanKim2022-08-302022-08-122022-08-172022-08-3020221932-5150WOS:000835428700017https://imec-publications.be/handle/20.500.12860/40250Exploration of alternative mask for 0.33NA extreme ultraviolet single patterning at pitch 28-nm metal designJournal article10.1117/1.JMM.21.2.024401WOS:000835428700017EUVextreme ultraviolet single patterning; mask absorber; source mask optimization; logic; pitch 28 nm