Study of multilayer defects on sub-32nm HP EUV reticles

Van Den Heuvel, DieterDieterVan Den HeuvelJonckheere, RikRikJonckheereBret, TristanTristanBretWaiblinger, MarkusMarkusWaiblinger2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/21688Study of multilayer defects on sub-32nm HP EUV reticlesOral presentationwww.sematech.org/10258/