Lawrie, Kirsten J.Kirsten J.LawrieBlakey, IdrissIdrissBlakeyBlinco, James P.James P.BlincoCheng, Han HaoHan HaoChengGronheid, RoelRoelGronheidJack, Kevin S.Kevin S.JackPollentier, IvanIvanPollentierLeeson, Michael J.Michael J.LeesonYounkin, ToddToddYounkinWhittaker, Andrew K.Andrew K.Whittaker2021-10-192021-10-1920110959-9428https://imec-publications.be/handle/20.500.12860/19252Chain scission resists for extreme ultraviolet lithography based on high performance polysulfone-containing polymersJournal article