A comprehensive LER-aware TDDB lifetime model for advanced Cu interconnects

Stucchi, MicheleMicheleStucchiRoussel, PhilippePhilippeRousselTokei, ZsoltZsoltTokeiDemuynck, StevenStevenDemuynckGroeseneken, GuidoGuidoGroeseneken2021-10-192021-10-1920111530-4388https://imec-publications.be/handle/20.500.12860/19847A comprehensive LER-aware TDDB lifetime model for advanced Cu interconnectsJournal article