Ronse, KurtKurtRonseJansen, PhilippePhilippeJansenGronheid, RoelRoelGronheidHendrickx, EricEricHendrickxMaenhoudt, MireilleMireilleMaenhoudtWiaux, VincentVincentWiauxGoethals, MiekeMiekeGoethalsJonckheere, RikRikJonckheereVandenberghe, GeertGeertVandenberghe2021-10-182021-10-182009https://imec-publications.be/handle/20.500.12860/16136Lithography options for the 32nm half pitch node and beyondJournal article