Point of use HF purification for silicon surface preparation by ion exchange

Fyen, WimWimFyenMouche, LaurentLaurentMoucheMeuris, MarcMarcMeurisHeyns, MarcMarcHeynsZahka, J.J.Zahka2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/1889Point of use HF purification for silicon surface preparation by ion exchangeJournal article