Struyf, HerbertHerbertStruyfde Marneffe, Jean-FrancoisJean-Francoisde MarneffeGoossens, DannyDannyGoossensHendrickx, DirkDirkHendrickxHuffman, CraigCraigHuffmanKunnen, EddyEddyKunnenLazzarino, FredericFredericLazzarinoMilenin, AlexeyAlexeyMileninShamiryan, DenisDenisShamiryanUrbanowicz, AdamAdamUrbanowiczVandervorst, AlainAlainVandervorstBoullart, WernerWernerBoullart2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/18046Metal hard-mask based double patterning for 22nm and beyondProceedings paper