Fundamental investigation of chemical mechanical polishing of GaAs in ailica dispersions: Material removal and arsenic trihydride formation pathways

Ong, PatrickPatrickOngMatovu, J.B.J.B.MatovuLeunissen, PeterPeterLeunissenKrishnan, SitaramanSitaramanKrishnanBabu, S.V.S.V.Babu2021-10-212021-10-2120132162-8769https://imec-publications.be/handle/20.500.12860/22886Fundamental investigation of chemical mechanical polishing of GaAs in ailica dispersions: Material removal and arsenic trihydride formation pathwaysJournal articlehttp://jss.ecsdl.org/content/2/11/P432