A Ge matrix removal method for metallic contamination analysis on Ge wafers using TXRF

Hellin, DavidDavidHellinGeens, VeerleVeerleGeensTeerlinck, IvoIvoTeerlinckRip, JensJensRipTheuwis, AntoonAntoonTheuwisDe Gendt, StefanStefanDe GendtVinckier, ChrisChrisVinckier2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9014A Ge matrix removal method for metallic contamination analysis on Ge wafers using TXRFOral presentation