Track optimization and control for 32nm node double patterning and beyond

Laidler, DavidDavidLaidlerRosslee, CraigCraigRossleeD'have, KoenKoenD'haveLeray, PhilippePhilippeLerayTedeschi, LenLenTedeschi2021-10-172021-10-172009https://imec-publications.be/handle/20.500.12860/15647Track optimization and control for 32nm node double patterning and beyondProceedings paper