Surface chemistry and Fermi level movement during the self-cleaning of GaAs by trimethyl-aluminum

Tallarida, MassimoMassimoTallaridaAdelmann, ChristophChristophAdelmannDelabie, AnneliesAnneliesDelabieVan Elshocht, SvenSvenVan ElshochtCaymax, MattyMattyCaymaxSchmeisser, DieterDieterSchmeisser2021-10-192021-10-192011-070003-6951https://imec-publications.be/handle/20.500.12860/19862Surface chemistry and Fermi level movement during the self-cleaning of GaAs by trimethyl-aluminumJournal articlehttp://apl.aip.org/resource/1/applab/v99/i4/p042906_s1