A snapshot review on metal-semiconductor contact exploration for 7-nm CMOS technology and beyond

Yu, HaoHaoYuSchaekers, MarcMarcSchaekersEveraert, Jean-LucJean-LucEveraertHoriguchi, NaotoNaotoHoriguchiDe Meyer, KristinKristinDe MeyerCollaert, NadineNadineCollaert2023-04-202022-12-052022-12-162023-04-202022-11-212731-5894WOS:000886449500004https://imec-publications.be/handle/20.500.12860/40828A snapshot review on metal-semiconductor contact exploration for 7-nm CMOS technology and beyondJournal article review10.1557/s43580-022-00404-1WOS:000886449500004TRANSMISSION-LINE MODELGE PREAMORPHIZATIONBARRIER HEIGHTSRESISTIVITYSITIRESISTANCEIMPLANTATIONJUNCTIONSSILICIDE