Effect of silylation on triethoxyfluorosilane xerogel films by means of atmospheric pressure drying

Orozco-Teran, R.A.R.A.Orozco-TeranGorman, B.P.B.P.GormanMueller, D.W.D.W.MuellerBaklanov, MikhaïlMikhaïlBaklanovReidy, R.F.R.F.Reidy2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10963Effect of silylation on triethoxyfluorosilane xerogel films by means of atmospheric pressure dryingJournal article