Characterization of silicon surfaces after low temperature H2 annealing prior to low temperature atmospheric pressure epitaxial silicon growth

Bender, HugoHugoBenderMouche, M. J.M. J.MoucheCaymax, MattyMattyCaymax2021-09-302021-09-301997https://imec-publications.be/handle/20.500.12860/1726Characterization of silicon surfaces after low temperature H2 annealing prior to low temperature atmospheric pressure epitaxial silicon growthProceedings paper